粗糙化的基板支撑件

Roughened substrate support

Abstract

本发明一般是有关于一种用于在一基板处理腔体中使用的基板支撑件。一粗糙化的基板支撑件减少在腔体内的电弧且亦提供均匀沉积于基板上。粗糙化可以两个步骤执行。于一第一步骤中,基板支撑件是进行喷珠以初步地粗糙化表面。接着,粗糙化的表面是以较细的磨粒进行喷珠,以产生一具有介于约707微英寸及约837微英寸间的表面粗糙度的基板支撑件。在表面粗糙化之后,基板支撑件进行阳极处理。
The present invention generally relates to a substrate support for use in a substrate processing chamber. A roughened substrate support reduces arcing within the chamber and also contributes to uniform deposition on the substrate. The roughening can occur in two steps. In a first step, the substrate support is bead blasted to initially roughen the surfaces. Then, the roughened surface is bead blasted with a finer grit to produce a substrate support with a surface roughness of between about 707 micro-inches and about 837 micro-inches. Following the surface roughening, the substrate support is anodized.

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